Library
You will find here a variety of relevant technical publications involing OnFILTER staff as authors, as well as links to some industry papers of critical importance. The papers are in no particular order of significance or subject matter.
Intel® Manufacturing Enabling Guide, Section 3: ESD/EOS 2010This document describes EOS as "...the number one cause of damage to IC components" (Section 3.2)
Electric Overstress and Its Effects on Today's ManufacturingOverview of EOS issues in today's electronic manufacturing. Pulse Magazine, EEWeb; issue 42, April 2012
Electric Overstress: The New FrontierPaper presented at the Philippines' ESD Forum, February 16, 2012
Electrical Overstress (EOS) and Its Effects on Today’s ManufacturingEEWeb, January 2012
EMI Issues in Semiconductor Manufacturing EnvironmentTaiwan ESD Symposium, 2006
EMI Issues in the Manufacturing EnvironmentConformity Magazine, January 2007
EMI-Caused EOS Exposure of Components and its MitigationPresented at the ESD Symposium on Factory Issues, Singapore, November 2012
EMI-Caused EOS in Manufacturing EnvironmentPresented at Taiwan ESD and Reliability Conference, Hsinchu, November 2012
EOS Damage by Electrical Fast Transients on AC PowerPresented at the EOS/ESD Symposium in 2010
EOS Exposure of Components in Soldering ProcessEEWeb, May 3, 2012
EOS Exposure of Components in Soldering ProcessPulse Magazine, Issue 55, June 2012. Reprint from EEWeb article May 2012. Full issue of Pulse magazine can be downloaded at this link.
EOS Exposure of Components in Soldering ProcessOnFILTER' Presentation on EOS in Soldering at IPC APEX 2013
EOS Exposure of Magnetic Heads and Assemblies in Automated ManufacturingESD Symposium, 2005
Grounding and Reliable Operation of EquipmentERI News, May 2007. See page 2
How Good is Your Ground?Evaluation Engineering, 2001
Importance of Being GroundedIPC Design Councile Route Magazine, June 2008
Near-Field Methods of Locating EMI SourcesCompliance Engineering Magazine, May-June, 2005
OnFILTER Advantage: Technical brief on OnFILTER technologyOrigins of EOS in Manufacturing Environment and Its ClassificationPresented at ESD Symposium in 2009 in Anaheim
Tech Corner: How to Measure Ground the Right Way3M Static Digest, Spring 2009. See pages 6..8
The effects of EMI from cell phones on GMR magnetic recording heads and test equipmentJournal of Electrostatic, Issue 54, 2002
Warranty StatementWarranty Statement for OnFILTER Products
