
Technical Articles
Semiconductor Manufacturing and EMI
Comply with SEMI E176 "Guide to Assess and Minimize Electromagnetic Interference (EMI) in a Semiconductor Manufacturing Environment"
Reduction of electrical overstress (EOS) and error-free operation of equipment are the main drivers to reduce electromagnetic interference (EMI) in semiconductor manufacturing environment. High precision, nearly-complete automation, premium value of manufactured products, and their long-term reliability expectations - all requires uninterrupted operation, minimum variations in process, reliable measurements, near-100% yield, and, critically, reduction of latent damage, i.e. failures in the field. EMI interferes with these requirements in different but similar ways in each segment of semiconductor manufacturing. SEMI E176 Standard provides specific recommendations to semiconductor manufacturers on acceptable levels of EMI and on EMI mitigation. Read more about SEMI E176 in this and this articles in inCompliance Magazine (both are in our Library). OnFILTER' products help semiconductor manufacturers to comply with SEMI E176 and reduce influence of EMI.
Wafer Manufacturing: Front End

Main EMI Challenges
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Uninterrupted operation
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Accurate metrology
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Error-free data communication
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Consistent process and "recipes"
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Reduction of EOS
Device Manufacturing: Back End

Main EMI Challenges
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Low EOS exposure to devices
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Error-free device test
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Uninterrupted operation
Practical Aspects of Managing EMI-Caused EOS in IC Handlers and Similar Equipment
The Implementation of SEMI E176: Guide to Assessing and Minimizing Electromagnetic Interference in a Semiconductor Manufacturing Environment
Presentation on SEMI EMC Standards
Dealing With EMI in Semiconductor Manufacturing, Part II: SEMI E176-1017 Standard
Electromagnetic Compliance - a View from the Field
EMI-Generated EOS in a Wire Bonder
Intel® Manufacturing Enabling Guide